Seigi Suh : rechercher sur Z-Library

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1

Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics

Gordon, Roy G., Becker, Jill, Hausmann, Dennis, Suh, Seigi

Journal:

Chemistry of Materials

Année:

2001

Langue:

english

Fichier:

PDF, 26 KB

english, 2001

2

Synthesis and Structural Characterization of Tantalum(IV) Amido Compounds

Suh, Seigi, Hoffman, David M.

Journal:

Inorganic Chemistry

Année:

1996

Langue:

english

Fichier:

PDF, 136 KB

english, 1996

3

ChemInform Abstract: Chemical Vapor Deposition of Gallium Sulfide Thin Films.

Seigi Suh, David M. Hoffman

Journal:

Année:

2001

Fichier:

PDF, 33 KB

2001

4

ChemInform Abstract: Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics.

Roy G. Gordon, Jill Becker, Dennis Hausmann, Seigi Suh

Journal:

Année:

2001

Langue:

english

Fichier:

PDF, 34 KB

english, 2001

5

Synthesis of ethyl zinc fluoroalkoxide complexes and the crystal structure of [EtZn(py){μ-OCH(CF3)2}]2

Seigi Suh, Liliana A. Mîinea, Saba Javed, David M. Hoffman

Journal:

Année:

2008

Langue:

english

Fichier:

PDF, 140 KB

english, 2008

6

Atmospheric-pressure chemical vapor deposition of fluorine-doped tin oxide thin films

Seigi Suh, Zuhua Zhang, Wei-Kan Chu, David M. Hoffman

Journal:

Thin Solid Films

Année:

1999

Langue:

english

Fichier:

PDF, 162 KB

english, 1999

7

General Synthesis of Homoleptic Indium Alkoxide Complexes and the Chemical Vapor Deposition of Indium Oxide Films

Suh, Seigi, Hoffman, David M.

Journal:

Journal of the American Chemical Society

Année:

2000

Langue:

english

Fichier:

PDF, 220 KB

english, 2000

8

Precursor Oxidation State Control of Film Stoichiometry in the Metal−Organic Chemical Vapor Deposition of Tin Oxide Thin Films

Suh, Seigi, Hoffman, David M., Atagi, Lauren M., Smith, David C., Liu, Jia-Rui, Chu, Wei-Kan

Journal:

Chemistry of Materials

Année:

1997

Langue:

english

Fichier:

PDF, 174 KB

english, 1997

9

Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor

Becker, Jill S., Suh, Seigi, Wang, Shenglong, Gordon, Roy G.

Journal:

Chemistry of Materials

Année:

2003

Langue:

english

Fichier:

PDF, 179 KB

english, 2003

10

Chemical Vapor Deposition of Cerium Oxide Films from a Cerium Alkoxide Precursor

Suh, Seigi, Guan, Jun, Mîinea, Liliana A., Lehn, Jean-Sébastien M., Hoffman, David M.

Journal:

Chemistry of Materials

Année:

2004

Langue:

english

Fichier:

PDF, 196 KB

english, 2004

11

Indium Tris(alkylthiolate) Compounds

Suh, Seigi, Hoffman, David M.

Journal:

Inorganic Chemistry

Année:

1998

Langue:

english

Fichier:

PDF, 79 KB

english, 1998

12

Synthesis of Tin Oxide Precursors and Related Germanium and Lead Compounds

Suh, Seigi, Hoffman, David M.

Journal:

Inorganic Chemistry

Année:

1996

Langue:

english

Fichier:

PDF, 202 KB

english, 1996

13

Chemical Vapor Deposition of Gallium Sulfide Thin Films

Suh, Seigi, Hoffman, David M.

Journal:

Chemistry of Materials

Année:

2000

Langue:

english

Fichier:

PDF, 278 KB

english, 2000

14

Synthesis and Structures of Gallium Alkylthiolate Compounds

Suh, Seigi, Hardesty, Jon H., Albright, Thomas A., Hoffman, David M.

Journal:

Inorganic Chemistry

Année:

1999

Langue:

english

Fichier:

PDF, 176 KB

english, 1999

15

Indium Fluoroalkoxide Compounds

Mîinea, Liliana A., Suh, Seigi, Hoffman, David M.

Journal:

Inorganic Chemistry

Année:

1999

Langue:

english

Fichier:

PDF, 138 KB

english, 1999

16

Perkin communications. A new method for the preparation of 1,5-dicarbonyl compounds from bicyclic ketals

Jun, Jong-Gab, Suh, Seigi, Shin, Dong Gyun

Journal:

Journal of the Chemical Society Perkin Transactions 1

Année:

1989

Langue:

english

Fichier:

PDF, 159 KB

english, 1989

17

Synthesis of aluminium and gallium fluoroalkoxide compounds and the low pressure metal-organic chemical vapor deposition of gallium oxide films

Mîinea, Liliana, Suh, Seigi, Bott, Simon G., Liu, Jia-Rui, Chu, Wei-Kan, Hoffman, David M.

Journal:

Journal of Materials Chemistry

Année:

1999

Langue:

english

Fichier:

PDF, 177 KB

english, 1999

18

A new precursor for the chemical vapor deposition of tantalum nitride films

Lehn, Jean-S�bastien M., van der Heide, Paul, Wang, Yongqiang, Suh, Seigi, Hoffman, David M.

Journal:

Journal of Materials Chemistry

Année:

2004

Langue:

english

Fichier:

PDF, 459 KB

english, 2004

19

Syntheses and crystal structures of tantalum(IV) amido and imido halide complexes

Hoffman, David M., Suh, Seigi

Journal:

Journal of the Chemical Society Chemical Communications

Année:

1993

Langue:

english

Fichier:

PDF, 286 KB

english, 1993

20

Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten

Kim, Do-Heyoung, Kim, Young Jae, Song, Yo Soon, Lee, Byung-Teak, Kim, Jin Hyeok, Suh, Seigi, Gordon, Roy

Journal:

Journal of The Electrochemical Society

Année:

2003

Langue:

english

Fichier:

PDF, 210 KB

english, 2003

21

Alternating Layer Chemical Vapor Deposition (ALD) of Metal Silicates and Oxides for Gate Insulators

Gordon, Roy G., Becker, Jill, Hausmann, Dennis, Suh, Seigi

Journal:

MRS Proceedings

Année:

2001

Langue:

english

Fichier:

PDF, 85 KB

english, 2001

22

Chemical Vapor Deposition (CVD) of Tungsten Nitride for Copper Diffusion Barriers

Gordon, Roy G., Barton, Jeffrey, Suh, Seigi

Journal:

MRS Proceedings

Année:

2001

Langue:

english

Fichier:

PDF, 287 KB

english, 2001

23

SPIE Proceedings [SPIE Micromachining and Microfabrication - San Jose, CA (Saturday 25 January 2003)] Micromachining and Microfabrication Process Technology VIII - Direct thin-film imaging, DTFI, based on PMOD (photochemical metal-organic deposition) methodology

Madsen, Harold O., Suh, Seigi, Svendsen, Leo G., Mukherjee, Shyama P., Roman, Jr., Paul J., Fury, Michael A., Ip, Katy, Yasaitis, John A., Perez-Maher, Mary Ann, Karam, Jean Michel

Année:

2003

Langue:

english

Fichier:

PDF, 950 KB

english, 2003

24

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Hybrid bilayer imaging approach using single component metal-organic precursors for high-resolution electron beam lithography

Jeyakumar, Augustin, Henderson, Clifford L., Roman, Jr., Paul J., Suh, Seigi, Fedynyshyn, Theodore H.

Année:

2003

Langue:

english

Fichier:

PDF, 1011 KB

english, 2003